Image Sensor and Camera Technology Training Tour

Aphesa organizes an image sensor and camera technology training tour between October 2015 and November 2016. The training sessions are organized as three days per location and split over several courses, it is possible to subscribe for a single course, multiple courses or the full session.

The courses are introductory to mid-level, with some advanced topics, and are designed for engineers who are new to the field of imaging or non-engineering personnel who needs a more in-depth understanding of the technology. It is also a good refresher course for experienced engineers and a good introductory course for sales, marketing and support personnel. Each course is accompanied by a question and answer session and an open discussion session.

The course agenda:

– Monday, October 12th:

• Introduction to imaging (light, light spectrum, light sources, scene, behavior of light, basic radiometry and photometry, lighting techniques, polarization, filters, optical basics, MTF, camera basics, color issues, multispectral and hyperspectral imaging, camera interfaces, photography and imaging terms, lens standards, camera interface standards)
• Introduction to CMOS image sensors (photodiodes, pixels, arrays, readout circuits, ADC circuits, architectures, spatial and temporal noise sources and noise compensation, color filters, microlenses, dark current, defect pixels, ageing, temperature effects, image sensor design flow).

– Tuesday, October 13th:

• Introduction to software based (mutliple exposure) high dynamic range imaging, including algorithms and artifacts
• Specific CMOS image sensors for high dynamic range imaging, including control methods, pixel designs and artifacts
• Introduction to 3D imaging
• Introduction to the EMVA1288 standard
• Introduction to high speed and real time imaging

– Wednesday, October 14th:

• Introduction to image processing

The Training Tour path is:

• October 2015 – Spa, Belgium – minimum of 4 attendees per course
• Early December 2015 – Yokohama, Japan – minimum of 19 attendees per course
• Late January 2016 – San Diego, CA – minimum of 10 attendees per course
• Early February 2016 – San Francisco, CA (limited courses only as part of SPIE Photonics
• West and IS&T Electronic Imaging, separate symposium registration required)
• Early May 2016 – Boston, MA – minimum of 7 attendees per course
• July 2016 – Seoul, South Korea – minimum of 11 attendees per course
• November 2016 – Stuttgart, Germany – minimum of 8 attendees per course