Tuesday, March 09, 2021
Sony Announces Large Format 127.68MP Global Shutter Sensor
PRNewswire: Sony announces the upcoming release of a large format 56.73mm diagonal CMOS sensor "IMX661" for industrial equipment with a global shutter and the industry's highest effective pixel count of 127.68MP. Its optical size nearly 10 times larger than the common 1.1-type image sensor corresponded to the C mount for industrial equipment. It also features global shutter "Pregius" pixel and high-speed readout at a data rate nearly four times faster than conventional products.
The sampling of the new IMX661 sensor is planned for April 2021.
impressive... 46.2x32.9mm is larger than reticle size, right? that means the pixel area is stitched, right? maybe 2 parts (reticle is 26x33mm according to https://en.wikichip.org/wiki/mask)
ReplyDeleteYes also 35mm FF snensor has fabricated by stitching process.
DeleteDoes a user/integrator come across this somehow? For example Does firmware of a camera using such a large/stitched sensor have to care about different settings left/right for example to compensate slightly different properties, e.g. fpn?
DeleteStitching is not new, at Philips we have done 1D stitching for the first time in 1988 already, and in 1992 we implemented 2D stitching, at that time only with CCDs. Later the technique was used for CMOS as well. And YES, you do need to correct the images across the stitching lines, for dark FPN as well as for light FPN. This is not always that easy, but once you know the trick ....
ReplyDeleteIs any sensor larger than 26x33mm stitched due to this reticle size? Is this something like a constant value in semi manufacturing / lithography machines?
ReplyDeleteThe exact size of the maximum chip area manufacturable in one exposure step depends on the machines used in the litho clean room. And you can play a bit with this maximum chip size. I remember that in our case we were limited to 26 mm x 26 mm (it was an ASML stepper), but we "fooled" the machine a bit and could use 24 mm x 30 mm (the numbers can be a bit off, I do not recall the exact numbers, and maybe they are confidential). So in general you can say YES, above a certain chip area stitching will become mandatory. BTW, stitching is easier with older equipment, so do not go for the most advanced machines if older machines (= lower resolution) are available.
ReplyDeleteThanks Albert. The Litho machines (especially the optics/projection system and the actorics) are miracles to me, especially how they reach this insane local accuracy, the few nm error in projecting layer after layer on top of the other. by coincidence after reading this here, I came across an article in a magazine about the same effect (its in german... https://www.tedo-verlag.de/wp-content/uploads/dlm_uploads/2021/01/inVISION_1_2021.pdf - page 38, article does not tell much but mention that there is a correction for effects that occur due to the stitching of the large format sensor).
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