Bill Bintz, EVP, Product Development explained, "Strong growth in the image sensor market continues to drive robust demand for high energy implant. The new Purion XEmax, combined with the popular Purion XE family of products, will extend Axcelis' market and technology leadership in this high growth market."
The new Purion XEmax high energy implanter was designed for image sensor applications. The enhanced beamline features multiple filtration systems to eliminate energetic metal contaminants which can otherwise result in compromised dark current and white pixel count levels. The new system is built on the industry leading Purion XE high energy implant platform and features Axcelis' patented Boost Technology, which delivers beam energies up to 15 MeV. Purion XEmax is delivering the most precise angle and overall process control to enable higher quality photodiode performance for next generation CIS devices.
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