Tuesday, October 19, 2010

EVG Nanoimprint Systems Used for Microlens Manufacturing

PR Newswire: EVG reports that its recently announced SMS-NIL nanoimprint lithography is used in industrial environments for CMOS image sensors and micro-lens molding.

EVG's Soft Molecular Scale Nanoimprint Lithography, or SMS-NIL, technology patterns ultra-high-resolution features down to 12.5 nm on EVG's proven UV-NIL systems. The technology uses soft polymeric working stamps to avoid damaging costly master stamps, resulting in significantly lower processing costs compared to other nano-patterning techniques.

1 comment:

  1. This is a good news. When can they be operational in ML for CMOS image sensors?

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