Friday, November 16, 2012
TSMC Applies for Entrenched Color Filters Patent
TSMC patent application US20120280346 "Sensor structure for optical performance enhancement" by Jhy-Ming Hung, Jen-Cheng Liu, Dun-Nian Yaung and Chun-Chieh Chuang proposes placing FSI color filters in trenches, similar to what ST and Samsung presented some time ago. The 140a,b,c are the color filters in trenches between the metal routing 126:
Subscribe to:
Post Comments (Atom)
No comments:
Post a Comment
All comments are moderated to avoid spam and personal attacks.