Monday, July 27, 2009

Tessera Develops 3MP Wafer Level Optics with EDOF

Yahoo: Tessera announced it is developing one of the industry’s first 3MP wafer-level optics solutions that integrates extended depth of field (EDOF). Sampling of Tessera’s integrated 3MPix wafer-level optics technology is expected to start in Q4 2009.

I wonder if the EDOF is mainly needed to cover optics assembly tolerances, or there is enough enhancement to provide extended focus even after the misalignments take their toll.

7 comments:

  1. Doesn't Tessera use that fresnal lens technology from Eyesquad? If I remember correctly, that forces more resolution to the center of the image and doesn't really work the way wave front coding does. I don't think that the Eyesquad technology would cover misalignments.

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  2. Tessera recently acquired Dblur EDOF, which does cover the optical assembly inaccuracies.

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  3. Be interesting to see how this compares to the ST 3MPix WLC, again with DBlur inside...

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  4. Tessera uses Eyesquad technology.
    The OptiML technology is not just for EDoF!

    Features:
    - EDOF enable
    - Image enhancement
    - Low light capability

    Benefits:
    - Low profile/low cost lens designs
    - Relaxing manufacturing tolerances
    - Branding enabler


    Liran

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  5. Liran,

    You say that Eyesquad, rather than Dblur technology is used for relaxing manufacturing tolerances. Do I understand you correctly?

    Thank you in advance.

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  6. Hi,
    Both technologies among other things are used for relaxing manufacturing tolerances.

    Liran

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  7. Liran,

    Do you think the EDOF will work well when shooting code projected environment? (don't care on the albedo)

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