Thursday, November 07, 2013

Axelis on Image Sensor Manufacturing Challenges

Axelis published a nice video lecture on high energy implants in image sensor manufacturing:


  1. The deep Pwell is under STI which is amorphous material. In this case, all the channel effect should be suppressed. Is the deep Pwell implanted before STI fill ? In this case, how to fill STI in low temperature ?

    -yang ni

  2. I think he means channeling effect outwards into the photodiode region which will give variation in the full-well capacity/responsivity


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