Monday, August 29, 2022

2023 International Image Sensors Workshop - Call for Papers

The 2023 International Image Sensors Workshop (IISW) will be held in Scotland from 22-25 May 2023. The first call for papers is now available at this link: 2023 IISW CFP.



2023 International Image Sensor Workshop

Crieff Hydro Hotel, Scotland, UK

22-25 May, 2023

The 2023 International Image Sensor Workshop (IISW) provides a biennial opportunity to present innovative work in the area of solid-state image sensors and share new results with the image sensor community. Now in its 35th year, the workshop will return to an in-person format. The event is intended for image sensor technologists; in order to encourage attendee interaction and a shared experience, attendance is limited, with strong acceptance preference given to workshop presenters. As is the tradition, the 2023 workshop will emphasize an open exchange of information among participants in an informal, secluded setting beside the Scottish town of Crieff. The scope of the workshop includes all aspects of electronic image sensor design and development. In addition to regular oral and poster papers, the workshop will include invited talks and announcement of International Image Sensors Society (IISS) Award winners.

Papers on the following topics are solicited:

Image Sensor Design and Performance
CMOS imagers, CCD imagers, SPAD sensors
New and disruptive architectures
Global shutter image sensors
Low noise readout circuitry, ADC designs
Single photon sensitivity sensors
High frame rate image sensors
High dynamic range sensors
Low voltage and low power imagers
High image quality; Low noise; High sensitivity
Improved color reproduction
Non-standard color patterns with special digital processing
Imaging system-on-a-chip, On-chip image processing

Pixels and Image Sensor Device Physics
New devices and pixel structures
Advanced materials
Ultra miniaturized pixels development, testing, and characterization
New device physics and phenomena
Electron multiplication pixels and imagers
Techniques for increasing QE, well capacity, reducing crosstalk, and improving angular response
Front side illuminated, back side illuminated, and stacked pixels and pixel arrays
Pixel simulation: Optical and electrical simulation, 2D and 3D, CAD for design and simulation, improved models

Application Specific Imagers
Image sensors and pixels for range sensing: LIDAR, TOF,
RGBZ, Structured light, Stereo imaging, etc.
Image sensors with enhanced spectral sensitivity (NIR, UV, IR)
Sensors for DSC, DSLR, mobile, digital video cameras and mirror-less cameras
Array imagers and sensors for multi-aperture imaging,
computational imaging, and machine learning
Sensors for medical applications, microbiology, genome sequencing
High energy photon and particle sensors (X-ray, radiation)
Line arrays, TDI, Very large format imagers
Multi and hyperspectral imagers
Polarization sensitive imagers

Image sensor manufacturing and testing
New manufacturing techniques
Backside thinning
New characterization methods
Defects & leakage current

On-chip optics and imaging process technology
Advanced optical path, Color filters, Microlens, Light guides
Nanotechnologies for Imaging
Wafer level cameras
Packaging and testing: Reliability, Yield, Cost
Stacked imagers, 3D integration
Radiation damage and radiation hard imager


General Workshop Co-Chairs
Robert Henderson – The University of Edinburgh
Guy Meynants – Photolitics and KU Leuven

Technical Program Chair
Neale Dutton – ST Microelectronics

Technical Program Committee
Jan Bogaerts - GPixel, Belgium
Calvin Yi-Ping Chao - TSMC, Taiwan
Edoardo Charbon - EPFL, Switzerland
Bart Dierickx - Caeleste, Belgium
Amos Fenigstein - TowerJazz, Israel
Manylun Ha -  DB Hitek, South Korea
Vladimir Korobov - ON Semiconductor, USA
Bumsuk Kim - Samsung, South Korea
Alex Krymski - Alexima, USA
Jiaju Ma - Gigajot, USA
Pierre Magnan - ISAE, France
Robert Daniel McGrath - Goodix Technology, US 
Preethi Padmanabhan - AMS-Osram, Austria
Francois Roy - STMicroelectronics, France
Andreas Suess - Omnivision Technologies, USA

IISS Board of Directors
Boyd Fowler – OmniVision
Michael Guidash – R.M. Guidash Consulting
Robert Henderson – The University of Edinburgh
Shoji Kawahito – Shizuoka University and Brookman Technology
Vladimir Koifman – Analog Value
Rihito Kuroda – Tohoku University
Guy Meynants – Photolitics
Junichi Nakamura – Brillnics
Yusuke Oike – Sony (Japan)
Johannes Solhusvik – Sony (Norway)
Daniel Van Blerkom – Forza Silicon-Ametek
Yibing Michelle Wang – Samsung Semiconductor

ISS Governance Advisory Committee:
Eric Fossum - Thayer School of Engineering at Dartmouth, USA
Nobukazu Teranishi - University of Hyogo, Japan
Albert Theuwissen - Harvest Imaging, Belgium / Delft University of Technology, The Netherlands

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